View Key Features & Benefits by Series | CMP
Pleavalid CMP Filters Series | ||||||
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 | Pleavalid pleated CMP filters are well suited for higher solids slurries and those which may be more prone to agglomerations. The wide pleats provide more surface area which increases service life and fewer filter change outs. Cartridges and capsules come in a wide range of pore sizes, from 0.1um to 5.0um. Pleavalid cartridge filters can be used in in the global loop to protect on-tool filters. As capsules, the pleated design is an effective final filter, especially in higher solids oxide slurries. | |||||
| Pleated micro and nanofiber media | Provides high flow rates and dirt holding capacity
Effective in higher solids and reducing formation of agglomerations | |||||
| Polypropylene media | Compatible with most slurries | |||||
| Flushed with Ultra-Pure Water | Ensures high cleanliness and low particle shedding | |||||
Specs, Flow Curves, and Part Number Configurator → | ||||||
Keevalid CMP Filters Series | ||||||
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| Keevalid CMP filters are ideal where the highly efficient removal of defect causing contaminants is critical. The continuously graded pore structure removes defect causing particles while not changing the slurry manufacture's intended particle size distribution. Rolled nanofiber provides similar classification, but with higher flow characteristics. Cartridges and capsules come in a wide range of pore sizes, from 70nm to 40um, making them suitable for extending the life of downstream on-tool filters or as the final defect reducing solution just before slurry is dispensed. | |||||
| Graded-density PP Depth Media | Highly efficient in removing defect-causing particles without changing the intended working particle size distribution | |||||
| Optional Rolled PP Nanofiber Media | Provides the highest flux rate and efficient contaminant removal | |||||
| Flushed with Ultra-Pure Water | Ensures high cleanliness and low particle shedding | |||||
| Cartridge Length to 20" | Cartridge lengths are available for higher flow source and global loop applications | |||||
| Variety of Capsule Sizes | Fits most on-tool flow and spaces | |||||
Specs, Flow Curves, and Part Number Configurator | ||||||
Dualvalid CMP Filters Series | ||||||
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| Dualvalid CMP filters are uniquely designed for integrated circuit manufacturers and chemical mechanical planarization slurry manufacturers. Cobetter's patented construction combines two slurry filtration technologies, wide pleats and rolled graded density polypropylene media in one filter. The outer wide pleats increase media surface area and promote longer filter life, while the rolled media construction around the core provides efficient retention of those particles which are likely to cause scratches on the surface of the wafer. Dualvalid is a good choice for slurries where lower pressure drops are desirable, without giving up efficient defect-causing particle removal. | |||||
| Outer layer wide pleats | Provides high flow rates and dirt holding capacity | |||||
| Inner multi-layer nanofiber rolled media | Provides high flux rate and efficient defect causing particle removal | |||||
| Polypropylene Media | Compatible with most slurries | |||||
| Flushed with Ultra-Pure Water | Ensures high cleanliness and low particle shedding | |||||
Specs, Flow Curves, and Part Number Configurator → | ||||||