CMP Slurry Filtration

CMP Filtration (Chemical Mechanical Planarization)

Increasing semiconductor process challenges rely on water, chemicals, solvents, and gases which are free of yield killing submicron or nanometer size particles, as well as metal, ionic, and organic contaminants which can be leached from wetted materials. Filtration of these fluids is a critical requirement in semiconductor and other microelectronics processes. Filters and purification devices must remove the particles from upstream particle sources while not contributing other unwanted contaminants. We offer an extensive line of filtration products through our partner, Cobetter Filtration.

Pleavalid CMP Filters Series

Pleavalid pleated CMP filters are well suited for higher solids slurries and those which may be more prone to agglomerations. The wide pleats provide more surface area which increases service life and fewer filter change outs.

Cartridges and capsules come in a wide range of pore sizes, from 0.1um to 5.0um. Pleavalid cartridge filters can be used in in the global loop to protect on-tool filters. As capsules, the pleated design is an effective final filter, especially in higher solids oxide slurries.

Pleated micro and nanofiber media

Provides high flow rates and dirt holding capacity
Effective in higher solids and reducing formation of agglomerations

Polypropylene media

Compatible with most slurries

Flushed with Ultra-Pure Water

Ensures high cleanliness and low particle shedding

Specs, Flow Curves, and Part Number Configurator →

Without CMP (chemical mechanical planarization), advanced multi interconnect level semiconductor devices would not be possible. CMP slurries work chemically and mechanically on special tools (polishers) to smooth wafer surfaces. Well designed filters remove unwanted large hard particles and agglomerates in CMP slurries that can land on and scratch the wafer surface, while allowing engineered working particles in the slurry to pass through the filter.

Product Series	Membrane											Main Construction Material				Available Configuration
	PP	PES	PTFE	PE	Nylon66	Other	PFA	PP	HDPE	PVDF	316LSS	Capsule	Cartridge	Mini Cartridge	Housing
Pleavalid →	•							•				•	•
Keevalid →	•							•				•	•
Keevalid II→	•							•				•	•
Dualvalid →	•							•				•	•

Pleavalid CMP Filters Series

Keevalid CMP Filters Series

Keevalid CMP Filters Series
	Keevalid CMP filters are ideal where the highly efficient removal of defect causing contaminants is critical. The continuously graded pore structure removes defect causing particles while not changing the slurry manufacture's intended particle size distribution. Rolled nanofiber provides similar classification, but with higher flow characteristics. Cartridges and capsules come in a wide range of pore sizes, from 70nm to 40um, making them suitable for extending the life of downstream on-tool filters or as the final defect reducing solution just before slurry is dispensed.
		Graded-density PP Depth Media	Highly efficient in removing defect-causing particles without changing the intended working particle size distribution
		Optional Rolled PP Nanofiber Media	Provides the highest flux rate and efficient contaminant removal
		Flushed with Ultra-Pure Water	Ensures high cleanliness and low particle shedding
		Cartridge Length to 20"	Cartridge lengths are available for higher flow source and global loop applications
		Variety of Capsule Sizes	Fits most on-tool flow and spaces
		Specs, Flow Curves, and Part Number Configurator

Dualvalid CMP Filters Series

Dualvalid CMP Filters Series
	Dualvalid CMP filters are uniquely designed for integrated circuit manufacturers and chemical mechanical planarization slurry manufacturers. Cobetter's patented construction combines two slurry filtration technologies, wide pleats and rolled graded density polypropylene media in one filter. The outer wide pleats increase media surface area and promote longer filter life, while the rolled media construction around the core provides efficient retention of those particles which are likely to cause scratches on the surface of the wafer. Dualvalid is a good choice for slurries where lower pressure drops are desirable, without giving up efficient defect-causing particle removal.
		Outer layer wide pleats	Provides high flow rates and dirt holding capacity
		Inner multi-layer nanofiber rolled media	Provides high flux rate and efficient defect causing particle removal
		Polypropylene Media	Compatible with most slurries
		Flushed with Ultra-Pure Water	Ensures high cleanliness and low particle shedding
		Specs, Flow Curves, and Part Number Configurator →