Semiconductor Filtration & Purification Products

Increasing semiconductor process challenges rely on water, chemicals, solvents, and gases which are free of yield killing submicron or nanometer size particles, as well as metal, ionic, and organic contaminants which can be leached from wetted materials. Filtration of these fluids is a critical requirement in semiconductor and other microelectronics processes. Filters and purification devices must remove the particles from upstream particle sources while not contributing other unwanted contaminants. We offer an extensive line of filtration products through our partner, Cobetter Filtration.

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CMP Filtration (Chemical Mechanical Planarization)

Without CMP (chemical mechanical planarization), advanced multi interconnect level semiconductor devices would not be possible. CMP slurries work chemically and mechanically on special tools (polishers) to smooth wafer surfaces. Well designed filters remove unwanted large hard particles and agglomerates in CMP slurries that can land on and scratch the wafer surface, while allowing engineered working particles in the slurry to pass through the filter.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPESPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
Pleavalid →
Keevalid →
Dualvalid →

View Key Features & Benefits by Series | CMP

Pleavalid CMP Filters Series

Cobetter Semiconductor FiltrationPleavalid pleated CMP filters are well suited for higher solids slurries and those which may be more prone to agglomerations. The wide pleats provide more surface area which increases service life and fewer filter change outs.

Cartridges and capsules come in a wide range of pore sizes, from 0.1um to 5.0um. Pleavalid cartridge filters can be used in in the global loop to protect on-tool filters. As capsules, the pleated design is an effective final filter, especially in higher solids oxide slurries.
Pleated micro and nanofiber mediaProvides high flow rates and dirt holding capacity
Effective in higher solids and reducing formation of agglomerations
Polypropylene mediaCompatible with most slurries
Flushed with Ultra-Pure WaterEnsures high cleanliness and low particle shedding

Specs, Flow Curves, and Part Number Configurator →

Keevalid CMP Filters Series

Cobetter Semiconductor FiltrationKeevalid CMP filters are ideal where the highly efficient removal of defect causing contaminants is critical. The continuously graded pore structure removes defect causing particles while not changing the slurry manufacture's intended particle size distribution. Rolled nanofiber provides similar classification, but with higher flow characteristics.

Cartridges and capsules come in a wide range of pore sizes, from 70nm to 40um, making them suitable for extending the life of downstream on-tool filters or as the final defect reducing solution just before slurry is dispensed.
Graded-density PP Depth MediaHighly efficient in removing defect-causing particles without changing the intended working particle size distribution
Optional Rolled PP Nanofiber MediaProvides the highest flux rate and efficient contaminant removal
Flushed with Ultra-Pure WaterEnsures high cleanliness and low particle shedding
Cartridge Length to 20"Cartridge lengths are available for higher flow source and global loop applications
Variety of Capsule SizesFits most on-tool flow and spaces

Specs, Flow Curves, and Part Number Configurator →

Dualvalid CMP Filters Series

Cobetter Semiconductor FiltrationDualvalid CMP filters are uniquely designed for integrated circuit manufacturers and chemical mechanical planarization slurry manufacturers. Cobetter's patented construction combines two slurry filtration technologies, wide pleats and rolled graded density polypropylene media in one filter. The outer wide pleats increase media surface area and promote longer filter life, while the rolled media construction around the core provides efficient retention of those particles which are likely to cause scratches on the surface of the wafer.

Dualvalid is a good choice for slurries where lower pressure drops are desirable, without giving up efficient defect-causing particle removal.
Outer layer wide pleatsProvides high flow rates and dirt holding capacity
Inner multi-layer nanofiber rolled mediaProvides high flux rate and efficient defect causing particle removal
Polypropylene MediaCompatible with most slurries
Flushed with Ultra-Pure WaterEnsures high cleanliness and low particle shedding

Specs, Flow Curves, and Part Number Configurator →

Electronic Chemicals & Materials

Microelectronics, and especially semiconductor end users rely on highly specialized, very pure, chemicals, gases, and materials for device fabrication. Electronic chemicals must be delivered to device manufacturers with very few, very small particles. Filters are used to remove particles in a multi-step filtration process beginning with pre-filtration of raw materials and ending with final filter at the packaging step which allows these manufacturers to meet their customer’s strict particle specifications.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPESPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
Novacon →
Novacise →
Chemphobic →
Chemrapid →
Chemvast →
Chemega →
EPPX →
Prifend →
Prifend HF →
ArrayForce (Degasser)
Chemdeion
IonGard SL Purifier →
IonGard Aqua Purifier
IonGard DL Purifier
Photopex Nylon →
Photopex UPE →
Fluorolink Housing →
HCP Housing →

View Key Features & Benefits by Series | Electronic Chemicals & Materials Filters

Novacon Filters Series

Cobetter Semiconductor FiltrationNovacon® Series filters are specially designed for dilute acids, bases, and other process chemical mixtures as a cost-effective alternative for lower temperature wet etch and clean applications.The asymmetric PES (polyethersulfone) membrane provides significant retention of particles (down to 1nm) with additional beneficial characteristics including high flow rates, high particle holding capacity, and longer filter lifetime. In addition, the membrane structure and high surface energy is effective in reducing bubble formation during flow.

The HDPE (High-Density Polyethylene) supports and cartridge structure ensure low metal extractables during filtration.Novacon disposable filters fluoropolymer shell and one-piece structural design provides high mechanical strength and makes installations easier.
Highly asymmetric PES membraneCombines excellent retention and high flow
Ultra-clean performance out-of-box results in faster start up, reduces equipment pre-operation time
Low surfactant binding
High purity HDPE structure and PFA (for disposables) shellGood chemical compatibility
Low metal extractables
High membrane surface areaHigh flow rate and longer life
Industry standard connectionsEase of installation and replacement
Higher cleanliness optionMeets stringent process requirements for metals, anions, and organic contaminants
Prewet optionProvides convenience and decreases the chances of product contamination

Specs, Flow Curves, and Part Number Configurator →

Novacise Series

Cobetter Semiconductor FiltrationCobetter Novacise™ Series is a cost-effective filtration alternative for dilute acids, bases and other process chemicals which are often used in certain high-purity wet etch and clean microelectronics applications.

The asymmetric PES membrane provides desirable characteristics including a high flux rate, high dirt holding capacity, and longer filter lifetime. In addition, the membrane structure reduces bubbles formation during flow.

Cobetter Novacise Filters have efficient particle retention and low metal extractables. In addition,these cartridges have high mechanical strength and are suitable for a wide variety of filtration applications.
High surface energy highly assymetric PES membraneVery high flow rates and longer life
Excellent particle retention
Low surfactant binding
Shorter equipment pre-operation time
Polypropylene supports, cage, & core Low extractables
Good chemical compatibility
Manufactured in a cleanroom environmentMeets high semiconductor manufacturing standards
100% integrity tested Ensures fail-safe performance every time

Specs, Flow Curves, and Part Number Configurator →

Chemphobic Filters Series

Cobetter Semiconductor FiltrationChemphobic™ Filter Series are especially designed and ideally suited for high temperature and corrosive chemicals including hot H2SO4, H3PO4, and HNO3. The PTFE membrane ensures excellent chemical compatibility with consistent particle removal in a wide range of acids, bases and solvents. Ultra-clean all-fluropolymer construction construction minimizes metal extractables and other contaminants.

High membrane surface area options provide high flow rates and extended service life to meet demanding process and tool availability requirements.

Industry standard ultra-clean connections and the prewet option reduce equipment set up time. Its one-piece structural design and available T, L and In-line configurations make new installations and replacements easy.
All fluoropolymer constructionExcellent chemical compatibility
Ultra-low metal extractables
High membrane surface areaHigh flow rate and longer life
Industry standard connectionsEase of installation and replacement
Higher cleanliness optionMeets stringent process requirements for metals, anions, and organic contaminants
Prewet optionProvides convenience and decreases the chances of product contamination

Specs, Flow Curves, and Part Number Configurator →

ChemRapid Filters Series

Cobetter Semiconductor Filtration

Chemrapid™ Series filters are composed of a surface-modified PTFE membrane that is bonded with PFA, which results in ultra low metal extractables. It's higher surface energy solves the problem of membrane dewetting in process chemistries, especially those which are prone to outgassing.

Chemrapid™ Series filters improve flow performance, cleanliness and particle removal efficiency to help lower defect levels on wafers processed in challenging acidic and alkaline cleaning chemistries. The modified PTFE membrane enables semiconductor makers to meet their critical chemical filtration requirements.

Superior Filtration Efficiency and High Flow Rate 
Chemrapid™ is suitable for filtration of aqueous process chemicals, including H2SO4, H3PO4, HNO3, HCl, NH4OH, H2O2, and TMAH. The non-dewetting membrane performs well in high temperature acid and alkaline process chemistries, including SC1, SC2, and SPM.

Excellent chemical compatibility and low metal extractables provide stable process performance. The surface-modified PTFE membrane is more likely to remain fully wet, resulting in full utilization of the media for higher flow rates and superior filtration efficiency.

Pre-wet packaging and ultra-pure cleanliness reduces process start up time. Chemrapid's one-piece structural design makes it easy to install and replace while availability in T, L and In-line configurations simplifies system utilization.

All fluoropolymer construction

High chemical compatibility and ultra-low metal extractables

Surface modified PTFE

Resists dewetting and minimizes service disruption

100% integrity tested

Ensures complete particle capture from the start

High effective filtration area options

Provides high flow rates, low pressure drop, and long service life

Prewet option

Reduces equipment pre-operation time

Specs, Flow Curves, and Part Number Configurator →

Chemvast Filters Series

Cobetter Semiconductor FiltrationCobetter Chemvast™ filter series are available in three different PTFE membranes including hydrophobic PTFE, hydrophilic PTFE or non-dewetting PTFE.

With a HDPE support structure, the filter is highly compatible with most lower temperature, dilute semiconductor process chemistries Chemvast is available in a wide range of retention ratings and pore sizes to meet customer’s requirements.

Non-dewetting PTFE resists dewetting by increasing the surface energy of the membrane which results in higher flow rates and filtration efficiency. With its HDPE cage, core, and high purity membrane, Chemvast is a lower cost alternative compared to the all-fluoropolymer Chemrapid® Filter Series. Chemvast Hydrophilic PTFE membrane can be used to filter dilute acidic and alkaline chemistries, as well as polar solvents without pre-wetting.
HDPE Cage/CoreGood chemical compatibility
Low metal extractable
Lower cost compared to all-fluoropolymer filters
Non-dewetting PTFE membrane optionResists dewetting in lower temperature outgassing chemistries
Enhanced retention of particles
Hydrophilic PTFE membrane optionNo prewetting
Good performance in dilute HF solutions and some polar solvents
Prewet optionReduces pre-operation time
Easy start up with aqueous-based chemicals
100% integrity testedEnsures highly efficient particle retention every time

Specs, Flow Curves, and Part Number Configurator →

Chemega Filters Series

Cobetter Semiconductor FiltrationCobetter Chemega™ filters are available with hydrophobic and hydrophilic highly efficient PTFE membranes to meet a wide range of high-purity chemical and solvent filtration applications.

This filter is highly compatible with most lower temperature, dilute semiconductor process chemistries and solvents. Chemega is available in a wide range of retention ratings and pore sizes to meet customer’s requirements.

With its polypropylene cage, core, and high purity PTFE membrane, Chemega has low metal extractables and is a good filtration solution where high-purity and high particle removal is required. Chemega Hydrophilic PTFE membrane can be used to filter dilute acidic and alkaline chemistries, as well as polar solvents without pre-wetting.
Polypropylene Cage/CoreGood chemical compatibility
Low metal extractable
Hydrophilic PTFE membrane optionNo prewetting
Good performance in dilute HF solutions and some polar solvents
Prewet optionReduces pre-operation time
Easy start up with aqueous-based chemicals
100% integrity testedEnsures highly efficient particle retention every time

Specs, Flow Curves, and Part Number Configurator →

Photopex Nylon Filters Series

Cobetter Semiconductor FiltrationWith high flow rate performance, excellent retention capabilities and cleanliness, Cobetter Photopex Nylon 6,6 Filter Cartridges are well suited for fi ltering photoresists, solvents and other chemicals in semiconductor processes.

Photopex Nylon 6,6 Filter Cartridges use a pure unmodifi ed hydrophilic nylon membrane with guaranteed levels of metal extractable and particle cleanliness. The fi lter’s cleanliness reduces chemical waste and time to process after installation.

Cobetter Photopex Nylon 6,6 fi lters are available in a wide variety of sizes and confi gurations to meet all your requirements.
Cobetter nylon 6,6 membraneNaturally hydrophilic media wets out easily with most fluids
Adsorptive properties effective in removing certain contaminants
High particle removal efficiency
HDPE or PP supports and structureHigh chemical compatibility
High cleanliness, including low metal extractables
Cartridge length to 20 inchesHigh flow and longer service life for photochemical manufacturing
Wide range of capsule sizes and industry fittingsEasy installation and replacement of competitive capsules
Higher initial cleanliness Reduces pre-process time and chemical waste
100% integrity testedChance of abnormal particle passage is eliminated

Specs, Flow Curves, and Part Number Configurator →

Photopex UPE Filters Series

Cobetter Semiconductor FiltrationWith retention ratings from 1nm to 0.1μm, Cobetter Photopex™ UPE (Ultra-High Molecular Weight Polyethylene) Filter Cartridges ensure excellent retention, cleanliness and high chemical compatibility to meet the critical demands in semiconductor processes.

Cobetter's superior cleaning of the high purity HDPE (high-density polyethylene) structure ensures high cleanliness and low particle shedding. The unique UPE membrane morphology provides the highest retention of both hard particles and gels. High membrane surface area options make high flow rates and extended service life possible.

Cobetter Photopex UPE filters are available in a wide variety of sizes and configurations to meet all your requirements.
UPE membraneHighly efficient removal of hard and soft particles
Wets out easily with most solvents and resists
Resists dewetting in dilute acidic and alkaline chemistries
HDPE supports and structureHigh chemical compatibility
High cleanliness, including low metal extractables
High surface area optionsHigh flow rate and longer life
Wide range of capsule sizes and industry fittingsEasy installation and replacement of competitive capsules
Higher cleanliness optionMeets stringent process requirements for metals, anions, and organic contaminants
Prewet optionReduces pre-operation time
Easy start up with aqueous-based chemicals

Specs, Flow Curves, and Part Number Configurator →

EPPX Filters Series

Cobetter Semiconductor FiltrationEPPXGF Filter Cartridges are constructed of electronic grade PP (polypropylene) nanofiber to provide efficient effective pre-filtration of process cooling water and pure chemicals and solvents.
Highly porous nanofiber mediaProvides high flow rates, longer service life, in cost-effective device
High-purity PP heated and melted without using adhesivesLow extractables
Fast recovery to resistivity baseline
All-polypropylene constructionExcellent chemical compatibility with most acids, bases, and solvents.
Removal ratings from 0.1 μm to 25 μmMeets a wide range of requirements and specifications
Quality Assurance Manufactured in a facility which adheres to ISO 9001 practices.

Specs, Flow Curves, and Part Number Configurator →

Prifend RO Filters Series

Cobetter Semiconductor FiltrationPrifend™ High Service Time FDP Series filters are made of continuously rolled microfiber which can provide 3x greater lifetime than normal meltblown filters used in Pre-RO water treatment. These filters are generally used where longer lifetime, high dirt holding capacity, and low change-out frequence are required.
Continuously rolled PP graded microfiber mediaHigh contaminant holding capacity
Good particle retention efficiency
Multiple end cap optionsSuitable for use in a variety of industry-standard housings for easy installation in existing equipment
Wide range of pore sizesProvides drop-in solutions for a wide range of water pre-filtration applications
Lengths to 40 inchesFor high flow, high particle challenge applications

Specs, Flow Curves, and Part Number Configurator →

Prifend HF Filters Series

Cobetter Semiconductor FiltrationPrifend™ FDPHF HIGH Flow Filter Cartridges are large, 6-inch diameter, single open-ended pleated cartridge filters with polypropylene core, cage, and end caps. The larger diameter filters with up to 90 ft2 (8.4 m2) filtration area offer maximum flow rates as high as 396 gpm (90m3/hr) from a single cartridge. Flow direction is from inside to outside which ensures that all contamination is held within the filter.

With two media options, multi-layer polypropylene and PTFE, these filters provide much higher flow rates than typical cartridge filters, making installations and change outs quicker and easier.

The polypropylene fiber media provides high efficiency filtration for pure water manufacturing. With the PTFE membrane, Prifend is also an excellent choice for bulk-chemical filtration.
Multi-layer polypropylene pleated structure, 6-inch filtersLarge filtration area with high contaminant holding capacity and high throughput
Pleated PTFE mediaAvailable in removal ratings from 20 nm to 10 μm, making it a good choice for some chemical filtration applications which require high flow
Pure polypropylene core and cageProvides cleanliness and strength
Good chemical compatibility

Specs, Flow Curves, and Part Number Configurator →

IonGard SL Purifier Series

Cobetter Semiconductor FiltrationCobetter IonGard™ SL Purifier has been specifically designed for the removal of metal contaminants from photoresists and ultra high purity solvents.

By modifying the ion exchange groups on the surface of membrane, the IonGard SL Purifier provides a fast and effective metal ions removal capability in various solvents and solvent resin mixtures.

Available in a wide variety of sizes and configurations to meet all your requirements.
Modified PE purification membraneProvides high metal removal efficiency
Provides high ion-exchange capacity
Provides total metal removal for ultraclean chemical manufacturers
Ultraclean HDPE capsulesUltraclean capsules with industry-standard fittings are perfect for research and small batch production.
Manufactured in a cleanroomIonGard SL is clean packaged and ready to install
Cartridge length to 20"Ideal for resist and solvent production lines

Specs, Flow Curves, and Part Number Configurator →

HCP Housing Series

Cobetter Semiconductor FiltrationHCP Filter Housings are constructed of 100% natural polypropylene or PVDF without any coloring agents or chemicals. These housings provide broad chemical compatibility and are ideally suited for food & beverage, ultrapure water, and other high purity chemical applications.

100% natural polypropylene (PP) construction or PVDF

Provides cleanliness and broad chemical compatibility
Low extractables - no chemicals and colorants are released during filtration process.

T-line configuration with top inlet and top outlet

inlet and top outletT-line configuration allows tubing to be kept inline

Drain on housing bottom

Easy to drain

Specs, Flow Curves, and Part Number Configurator →

Photolithography

As semiconductor line widths shrink, photolithography technical boundaries are challenged and new photoresists and photochemicals with more stringent contaminant specifications are required. Special filters and purifiers for resists, UPW, certain organic solvents, remove hard and soft particles as well as certain ionic contaminants which can lead to increased defects during the resist coating process.

Product SeriesMembraneMain Construction MaterialAvailable Configuration
PPPESPTFEPENylon66OtherPFAPPHDPEPVDF316LSSCapsuleCartridge Mini CartridgeHousing
IonGard SL Purifier →
IonGard DL Purifier
Photopex Nylon →
Photopex UPE →
Nylonpolar

View Key Features & Benefits by Series | Photolithography

Photopex Nylon Filters Series

Cobetter Semiconductor FiltrationWith high flow rate performance, excellent retention capabilities and cleanliness, Cobetter Photopex Nylon 6,6 Filter Cartridges are well suited for fi ltering photoresists, solvents and other chemicals in semiconductor processes.

Photopex Nylon 6,6 Filter Cartridges use a pure unmodifi ed hydrophilic nylon membrane with guaranteed levels of metal extractable and particle cleanliness. The fi lter’s cleanliness reduces chemical waste and time to process after installation.

Cobetter Photopex Nylon 6,6 fi lters are available in a wide variety of sizes and confi gurations to meet all your requirements.
Cobetter nylon 6,6 membraneNaturally hydrophilic media wets out easily with most fluids
Adsorptive properties effective in removing certain contaminants
High particle removal efficiency
HDPE or PP supports and structureHigh chemical compatibility
High cleanliness, including low metal extractables
Cartridge length to 20 inchesHigh flow and longer service life for photochemical manufacturing
Wide range of capsule sizes and industry fittingsEasy installation and replacement of competitive capsules
Higher initial cleanliness Reduces pre-process time and chemical waste
100% integrity testedChance of abnormal particle passage is eliminated

Specs, Flow Curves, and Part Number Configurator →

Photopex UPE Filters Series

Cobetter Semiconductor FiltrationWith retention ratings from 1nm to 0.1μm, Cobetter Photopex™ UPE (Ultra-High Molecular Weight Polyethylene) Filter Cartridges ensure excellent retention, cleanliness and high chemical compatibility to meet the critical demands in semiconductor processes.

Cobetter's superior cleaning of the high purity HDPE (high-density polyethylene) structure ensures high cleanliness and low particle shedding. The unique UPE membrane morphology provides the highest retention of both hard particles and gels. High membrane surface area options make high flow rates and extended service life possible.

Cobetter Photopex UPE filters are available in a wide variety of sizes and configurations to meet all your requirements.
UPE membraneHighly efficient removal of hard and soft particles
Wets out easily with most solvents and resists
Resists dewetting in dilute acidic and alkaline chemistries
HDPE supports and structureHigh chemical compatibility
High cleanliness, including low metal extractables
High surface area optionsHigh flow rate and longer life
Wide range of capsule sizes and industry fittingsEasy installation and replacement of competitive capsules
Higher cleanliness optionMeets stringent process requirements for metals, anions, and organic contaminants
Prewet optionReduces pre-operation time
Easy start up with aqueous-based chemicals

Specs, Flow Curves, and Part Number Configurator →