Increasing semiconductor process challenges rely on water, chemicals, solvents, and gases which are free of yield killing submicron or nanometer size particles, as well as metal, ionic, and organic contaminants which can be leached from wetted materials. Filtration of these fluids is a critical requirement in semiconductor and other microelectronics processes. Filters and purification devices must remove the particles from upstream particle sources while not contributing other unwanted contaminants. We offer an extensive line of filtration products through our partner, Cobetter Filtration.
Choose your application…
CMP Filtration (Chemical Mechanical Planarization)
Without CMP (chemical mechanical planarization), advanced multi interconnect level semiconductor devices would not be possible. CMP slurries work chemically and mechanically on special tools (polishers) to smooth wafer surfaces. Well designed filters remove unwanted large hard particles and agglomerates in CMP slurries that can land on and scratch the wafer surface, while allowing engineered working particles in the slurry to pass through the filter.
| Product Series | Membrane | Main Construction Material | Available Configuration | ||||||||||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| PP | PES | PTFE | PE | Nylon66 | Other | PFA | PP | HDPE | PVDF | 316LSS | Capsule | Cartridge | Mini Cartridge | Housing | |||||||||||||
| Pleavalid → | • | • | • | • | |||||||||||||||||||||||
| Keevalid → | • | • | • | • | |||||||||||||||||||||||
| Keevalid II→ | • | • | • | • | |||||||||||||||||||||||
| Dualvalid → | • | • | • | • | |||||||||||||||||||||||
View Key Features & Benefits by Series | CMP
Pleavalid CMP Filters Series | ||||||
|---|---|---|---|---|---|---|
 | Pleavalid pleated CMP filters are well suited for higher solids slurries and those which may be more prone to agglomerations. The wide pleats provide more surface area which increases service life and fewer filter change outs. Cartridges and capsules come in a wide range of pore sizes, from 0.1um to 5.0um. Pleavalid cartridge filters can be used in in the global loop to protect on-tool filters. As capsules, the pleated design is an effective final filter, especially in higher solids oxide slurries. | |||||
| Pleated micro and nanofiber media | Provides high flow rates and dirt holding capacity
Effective in higher solids and reducing formation of agglomerations | |||||
| Polypropylene media | Compatible with most slurries | |||||
| Flushed with Ultra-Pure Water | Ensures high cleanliness and low particle shedding | |||||
Specs, Flow Curves, and Part Number Configurator → | ||||||
Keevalid CMP Filters Series | ||||||
|---|---|---|---|---|---|---|
| Keevalid CMP filters are ideal where the highly efficient removal of defect causing contaminants is critical. The continuously graded pore structure removes defect causing particles while not changing the slurry manufacture's intended particle size distribution. Rolled nanofiber provides similar classification, but with higher flow characteristics. Cartridges and capsules come in a wide range of pore sizes, from 70nm to 40um, making them suitable for extending the life of downstream on-tool filters or as the final defect reducing solution just before slurry is dispensed. | |||||
| Graded-density PP Depth Media | Highly efficient in removing defect-causing particles without changing the intended working particle size distribution | |||||
| Optional Rolled PP Nanofiber Media | Provides the highest flux rate and efficient contaminant removal | |||||
| Flushed with Ultra-Pure Water | Ensures high cleanliness and low particle shedding | |||||
| Cartridge Length to 20" | Cartridge lengths are available for higher flow source and global loop applications | |||||
| Variety of Capsule Sizes | Fits most on-tool flow and spaces | |||||
Specs, Flow Curves, and Part Number Configurator | ||||||
Keevalid II CMP Filters Series | ||||||
|---|---|---|---|---|---|---|
| Keevalid II CMP filters are the next generation based on Cobetteer's legacy Keevalid series. Like the original Keevalid series, these filters are available with depth or rolled micro and nanofiber media in a variety of sizes and configurations to meet a wide-range of process requirements. Filters are flushed with ultra-pure water to ensure cleanliness and low particle shedding. Like the original Keevalid series, these filters are available in the options depth or rolled micro and nanofiber media. | |||||
| Graded-density PP Depth Media | Highly efficient in removing defect-causing particles without changing the intended working particle size distribution | |||||
| Optional Rolled PP Nanofiber Media | Provides the highest flux rate and efficient contaminant removal | |||||
| Flushed with Ultra-Pure Water | Ensures high cleanliness and low particle shedding | |||||
| Cartridge Length to 20" | Cartridge lengths are available for higher flow source and global loop applications | |||||
| Variety of Capsule Sizes | Fits most on-tool flow and spaces | |||||
Specs, Flow Curves, and Part Number Configurator | ||||||
Dualvalid CMP Filters Series | ||||||
|---|---|---|---|---|---|---|
| Dualvalid CMP filters are uniquely designed for integrated circuit manufacturers and chemical mechanical planarization slurry manufacturers. Cobetter's patented construction combines two slurry filtration technologies, wide pleats and rolled graded density polypropylene media in one filter. The outer wide pleats increase media surface area and promote longer filter life, while the rolled media construction around the core provides efficient retention of those particles which are likely to cause scratches on the surface of the wafer. Dualvalid is a good choice for slurries where lower pressure drops are desirable, without giving up efficient defect-causing particle removal. | |||||
| Outer layer wide pleats | Provides high flow rates and dirt holding capacity | |||||
| Inner multi-layer nanofiber rolled media | Provides high flux rate and efficient defect causing particle removal | |||||
| Polypropylene Media | Compatible with most slurries | |||||
| Flushed with Ultra-Pure Water | Ensures high cleanliness and low particle shedding | |||||
Specs, Flow Curves, and Part Number Configurator → | ||||||
Electronic Chemicals & Materials
Microelectronics, and especially semiconductor end users rely on highly specialized, very pure, chemicals, gases, and materials for device fabrication. Electronic chemicals must be delivered to device manufacturers with very few, very small particles. Filters are used to remove particles in a multi-step filtration process beginning with pre-filtration of raw materials and ending with final filter at the packaging step which allows these manufacturers to meet their customer’s strict particle specifications.
| Product Series | Membrane | Main Construction Material | Available Configuration | ||||||||||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| PP | PES | PTFE | PE | Nylon66 | Other | PFA | PP | HDPE | PVDF | 316LSS | Capsule | Cartridge | Mini Cartridge | Housing | |||||||||||||
| Novacon → | • | • | • | • | |||||||||||||||||||||||
| Novacise → | • | • | • | • | |||||||||||||||||||||||
| Chemphobic→ | • | • | • | • | |||||||||||||||||||||||
| ChemRapid→ | • | • | • | • | |||||||||||||||||||||||
| ChemVast→ | • | • | • | • | |||||||||||||||||||||||
| Chemega → | • | • | • | • | |||||||||||||||||||||||
| EPPX → | • | • | • | ||||||||||||||||||||||||
| Prifend → | • | • | • | ||||||||||||||||||||||||
| Prifend HF → | • | • | • | ||||||||||||||||||||||||
| ArrayForce (Degasser) → | • | • | • | ||||||||||||||||||||||||
| Chemdeion | • | • | • | • | |||||||||||||||||||||||
| IonGard Aqua→ | • | • | • | • | • | ||||||||||||||||||||||
| IonGard DL → | • | • | • | • | • | • | |||||||||||||||||||||
| IonGard SL→ | • | • | • | • | |||||||||||||||||||||||
| Photopex Nylon → | • | • | • | • | • | ||||||||||||||||||||||
| Photopex UPE → | • | • | • | • | • | • | |||||||||||||||||||||
| Fluorolink Housing → | • | • | |||||||||||||||||||||||||
| HCP Housing → | • | • | • | ||||||||||||||||||||||||
View Key Features & Benefits by Series | Electronic Chemicals & Materials Filters
Novacon Filters Series | ||||||
|---|---|---|---|---|---|---|
 | Novacon® Series filters are specially designed for dilute acids, bases, and other process chemical mixtures as a cost-effective alternative for lower temperature wet etch and clean applications.The asymmetric PES (polyethersulfone) membrane provides significant retention of particles (down to 1nm) with additional beneficial characteristics including high flow rates, high particle holding capacity, and longer filter lifetime. In addition, the membrane structure and high surface energy is effective in reducing bubble formation during flow. The HDPE (High-Density Polyethylene) supports and cartridge structure ensure low metal extractables during filtration.Novacon disposable filters fluoropolymer shell and one-piece structural design provides high mechanical strength and makes installations easier. | |||||
| Highly asymmetric PES membrane | Combines excellent retention and high flow Ultra-clean performance out-of-box results in faster start up, reduces equipment pre-operation time Low surfactant binding | |||||
| High purity HDPE structure and PFA (for disposables) shell | Good chemical compatibility Low metal extractables | |||||
| High membrane surface area | High flow rate and longer life | |||||
| Industry standard connections | Ease of installation and replacement | |||||
| Higher cleanliness option | Meets stringent process requirements for metals, anions, and organic contaminants | |||||
| Prewet option | Provides convenience and decreases the chances of product contamination | |||||
Specs, Flow Curves, and Part Number Configurator | ||||||
Chemphobic Filters Series | ||||||
|---|---|---|---|---|---|---|
| Chemphobic™ Filter Series are especially designed and ideally suited for high temperature and corrosive chemicals including hot H2SO4, H3PO4, and HNO3. The PTFE membrane ensures excellent chemical compatibility with consistent particle removal in a wide range of acids, bases and solvents. Ultra-clean all-fluropolymer construction construction minimizes metal extractables and other contaminants. High membrane surface area options provide high flow rates and extended service life to meet demanding process and tool availability requirements. Industry standard ultra-clean connections and the prewet option reduce equipment set up time. Its one-piece structural design and available T, L and In-line configurations make new installations and replacements easy. | |||||
| All fluoropolymer construction | Excellent chemical compatibility Ultra-low metal extractables | |||||
| High membrane surface area | High flow rate and longer life | |||||
| Industry standard connections | Ease of installation and replacement | |||||
| Higher cleanliness option | Meets stringent process requirements for metals, anions, and organic contaminants | |||||
| Prewet option | Provides convenience and decreases the chances of product contamination | |||||
Specs, Flow Curves, and Part Number Configurator | ||||||
ChemRapid Filters Series | ||||||
|---|---|---|---|---|---|---|
| Chemrapid™ Series filters are composed of a surface-modified PTFE membrane that is bonded with PFA, which results in ultra low metal extractables. It's higher surface energy solves the problem of membrane dewetting in process chemistries, especially those which are prone to outgassing. | |||||
All fluoropolymer construction | High chemical compatibility and ultra-low metal extractables | |||||
Surface modified PTFE | Resists dewetting and minimizes service disruption | |||||
100% integrity tested | Ensures complete particle capture from the start | |||||
High effective filtration area options | Provides high flow rates, low pressure drop, and long service life | |||||
Prewet option | Reduces equipment pre-operation time | |||||
Specs, Flow Curves, and Part Number Configurator → | ||||||
Chemvast Filters Series | ||||||
|---|---|---|---|---|---|---|
| Cobetter Chemvast™ filter series are available in three different PTFE membranes including hydrophobic PTFE, hydrophilic PTFE or non-dewetting PTFE. With a HDPE support structure, the filter is highly compatible with most lower temperature, dilute semiconductor process chemistries Chemvast is available in a wide range of retention ratings and pore sizes to meet customer’s requirements. Non-dewetting PTFE resists dewetting by increasing the surface energy of the membrane which results in higher flow rates and filtration efficiency. With its HDPE cage, core, and high purity membrane, Chemvast is a lower cost alternative compared to the all-fluoropolymer Chemrapid® Filter Series. Chemvast Hydrophilic PTFE membrane can be used to filter dilute acidic and alkaline chemistries, as well as polar solvents without pre-wetting. | |||||
| HDPE Cage/Core | Good chemical compatibility Low metal extractable Lower cost compared to all-fluoropolymer filters | |||||
| Non-dewetting PTFE membrane option | Resists dewetting in lower temperature outgassing chemistries Enhanced retention of particles | |||||
| Hydrophilic PTFE membrane option | No prewetting Good performance in dilute HF solutions and some polar solvents | |||||
| Prewet option | Reduces pre-operation time Easy start up with aqueous-based chemicals | |||||
| 100% integrity tested | Ensures highly efficient particle retention every time | |||||
Specs, Flow Curves, and Part Number Configurator | ||||||
Chemega Filters Series | ||||||
|---|---|---|---|---|---|---|
| Cobetter Chemega™ filters are available with hydrophobic and hydrophilic highly efficient PTFE membranes to meet a wide range of high-purity chemical and solvent filtration applications. This filter is highly compatible with most lower temperature, dilute semiconductor process chemistries and solvents. Chemega is available in a wide range of retention ratings and pore sizes to meet customer’s requirements. With its polypropylene cage, core, and high purity PTFE membrane, Chemega has low metal extractables and is a good filtration solution where high-purity and high particle removal is required. Chemega Hydrophilic PTFE membrane can be used to filter dilute acidic and alkaline chemistries, as well as polar solvents without pre-wetting. | |||||
| Polypropylene Cage/Core | Good chemical compatibility Low metal extractable | |||||
| Hydrophilic PTFE membrane option | No prewetting Good performance in dilute HF solutions and some polar solvents | |||||
| Prewet option | Reduces pre-operation time Easy start up with aqueous-based chemicals | |||||
| 100% integrity tested | Ensures highly efficient particle retention every time | |||||
Specs, Flow Curves, and Part Number Configurator → | ||||||
EPPX Filters Series | ||||||
|---|---|---|---|---|---|---|
| EPPXGF Filter Cartridges are constructed of electronic grade PP (polypropylene) nanofiber to provide efficient effective pre-filtration of process cooling water and pure chemicals and solvents. | |||||
| Highly porous nanofiber media | Provides high flow rates, longer service life, in cost-effective device | |||||
| High-purity PP heated and melted without using adhesives | Low extractables Fast recovery to resistivity baseline | |||||
| All-polypropylene construction | Excellent chemical compatibility with most acids, bases, and solvents. | |||||
| Removal ratings from 0.1 μm to 25 μm | Meets a wide range of requirements and specifications | |||||
| Quality Assurance | Manufactured in a facility which adheres to ISO 9001 practices. | |||||
Specs, Flow Curves, and Part Number Configurator → | ||||||
Prifend RO Filters Series | ||||||
|---|---|---|---|---|---|---|
| Prifend™ High Service Time FDP Series filters are made of continuously rolled microfiber which can provide 3x greater lifetime than normal meltblown filters used in Pre-RO water treatment. These filters are generally used where longer lifetime, high dirt holding capacity, and low change-out frequence are required. | |||||
| Continuously rolled PP graded microfiber media | High contaminant holding capacity Good particle retention efficiency | |||||
| Multiple end cap options | Suitable for use in a variety of industry-standard housings for easy installation in existing equipment | |||||
| Wide range of pore sizes | Provides drop-in solutions for a wide range of water pre-filtration applications | |||||
| Lengths to 40 inches | For high flow, high particle challenge applications | |||||
Specs, Flow Curves, and Part Number Configurator → | ||||||
Prifend HF Filters Series | ||||||
|---|---|---|---|---|---|---|
| Prifend™ FDPHF HIGH Flow Filter Cartridges are large, 6-inch diameter, single open-ended pleated cartridge filters with polypropylene core, cage, and end caps. The larger diameter filters with up to 90 ft2 (8.4 m2) filtration area offer maximum flow rates as high as 396 gpm (90m3/hr) from a single cartridge. Flow direction is from inside to outside which ensures that all contamination is held within the filter. With two media options, multi-layer polypropylene and PTFE, these filters provide much higher flow rates than typical cartridge filters, making installations and change outs quicker and easier. The polypropylene fiber media provides high efficiency filtration for pure water manufacturing. With the PTFE membrane, Prifend is also an excellent choice for bulk-chemical filtration. | |||||
| Multi-layer polypropylene pleated structure, 6-inch filters | Large filtration area with high contaminant holding capacity and high throughput | |||||
| Pleated PTFE media | Available in removal ratings from 20 nm to 10 μm, making it a good choice for some chemical filtration applications which require high flow | |||||
| Pure polypropylene core and cage | Provides cleanliness and strength Good chemical compatibility | |||||
Specs, Flow Curves, and Part Number Configurator → | ||||||
IonGard Aqua Series | ||||||
|---|---|---|---|---|---|---|
| Cobetter IonGard™ Aqua Purifier has been specifically designed for the removal of metal contaminants from ultrapure water. The IonGard™ Aqua Purifier can immediately and spontaneously remove metal ions from the water through ion exchange groups, making it especially suitable for the semiconductor industry's most terminal final cleaning processes. Available in a wide variety of sizes and configurations to meet all of your requirements. Please contact your Cobetter sales engineer for additional information. | |||||
Modified PE membrane | High metal removal efficiency Total metal removal for ultra pure water | |||||
Clean manufacturing | Manufactured in a cleanroom environment | |||||
Specs, Flow Curves, and Part Number Configurator | ||||||
IonGard DL Purifier Series | ||||||
|---|---|---|---|---|---|---|
| Cobetter IonGard™ DL Purifiers have been specifically designed for semiconductor wafer cleaning applications. Utilizing the structure of polyethylene and polyethersulfone composite membranes, IonGard DL Purifiers assure excellent removal of trace metal ions as well as particles on the wafer surface. The Ultraclean product design minimizes system start up time and downtime. IonGard DL is available in a wide variety of sizes and configurations to meet all your requirements. | |||||
| Polyethersulfone filter membrane with modified PE ion exchange media | Superior removal of cations in critical cleaning water applications High removal efficiency of particles from 7nm. Ultra-low Particles and Metal Ions extractables | |||||
| Ultraclean capsules | Ultraclean capsules with industry-standard fittings are ideal for research and single-wafer wafer rinse steps. Designed to fit space-limited on-tool installations. | |||||
| Manufactured in a cleanroom | IonGard DL is clean packaged and ready to install | |||||
| Cartridge length to 30" | Longer cartridges are available for higher flow chemical blending production. | |||||
Specs, Flow Curves, and Part Number Configurator | ||||||